Application
Ultrapure Water
Key Features
and other electronics industries is increasing, and as related industries advance,
the purity and reliability standards for ultrapure water are becoming even stricter.
TRILITE® ion exchange resins for ultrapure water have been delivered domestically and internationally to ultrapure water facilities in the semiconductor, display (OLED, LCD) industries, and have acquired references of trust. They are contributing to improving our customers' competitiveness through stable quality control and timely delivery. TRILITE® ion exchange resins for ultrapure water are divided into URR100, UPR200, UPR300, and UPR400 series depending on the required ultrapure water quality.
- TRILITE® ion exchange resins for ultrapure water feature
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TRILITE® ion exchange resins for ultrapure water have a very high level of uniformity coefficient (less than 1.1) to achieve high operational exchange capacity even at high flow rates.
To minimize ion leakage, it has very high H and OH conversion rates.
Strict management is maintained to control total organic carbon (TOC) and trace metal ion leakage.
Ultrapure Water
Production
Process
Product
Selection Guide
Product Name | Outlet condition | Features and Application |
---|---|---|
UPRM100U | Guarantee) Resistivity > 17.0㏁∙cm Actual) Resistivity > 18.0㏁∙cm |
General electronics Demineralization, Final polisher |
UPRM200U | Resistivity > 18.1㏁∙cm(in 30 min) △TOC < 5 ppb (in 120min) |
Display Demineralization, Final polisher |
UPRM300U | Resistivity > 18.2㏁∙cm(in 30 min) △TOC < 1 ppb (in 180min) |
Display, Semiconductor grade Final polisher |
UPRM400U | Resistivity > 18.2㏁∙cm(in 30 min) △TOC < 1 ppb (in 180min) Metal impurity (ppm, as Dry Base) Na<1, Fe<1, Zn<0.5, Al<0.5 |
Semiconductor grade Final polisher |
UPHR1 | Resistivity > 18.2㏁∙cm(in 24hr) △TOC < 1 ppb (in 24hr) |
Removal of organic contaminants in semiconductors |
CLR-B3UP | Resistivity > 17.0㏁∙cm(in 48hr) △TOC < 5 ppb (in 48hr) |
Ultrapure Water boron removal |
Product
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